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What exactly is Hafnium Disilicide (HfSi2)?

The molecular formula of HfSi2 is hafnium disilicide. It is a gray powder.

Hafnium-disilicide can be described as a type or transition metal silicide, and a type or refractory intermediatemetallic compounds. Hafnium is a great physical and chemical substance that is used to make semiconductor components using metal oxides that are complementary and thin film coatings. It is also used to create bulk structural components photovoltaic materials, as well as other fields.

Nanomaterials made of hafnium-disilicide possess unique optical, electrical, magnetic, and thermoelectric properties. This makes them suitable for use in catalysis.

What is Hafnium disilicide HfSi2 employed for?

1. To prepare silicon carbide-hafnium silicide-tantalum silicide (SiC-HfSi2-TaSi2) anti-ablation composite coating

Carbon carbon reinforced with fiber (Chand C), a new type high-temperature resistant composite that makes use of carbon fiber as a reinforcement and carbon as the matrix. Because of its excellent high temperature strength, ablation resistance and good friction and wear properties, in the 1970s, the United States carried out the research on Chammer C composites for thermal structure. This led to the development of Cmax C composites from cauterized heat-proof materials to thermal structure materials. C/C is a structurally thermal material and can be used in the space shuttle nose cone cap, wing leads edge, and gas turbine engine components. These parts can be used in high-temperature environments and for oxidation.

CPAC composites are easily oxidized and don’t perform well in an environment of 400°C. Chammer C composites require adequate protection against oxidation. To safeguard the composites from oxidation, anti-oxidation coatings must be developed. The results show that when refractory metal Zr, Hf, Ta TiB2 and various other refractory metals are added to the carbon matrix the resistance to ablation of C and C composites can be further improved. To understand the influence of Hf,Ta on Chand-C composites’ ablation capabilities, SiC–HfSi2-TaSi2 anti ablation coatings were made through embedding. Oxyacetylene ablation devices measured the coating’s ablation performance. Knot.

2. To make organic light emitting devices.

The package cover covers the light-emitting layer as well as the cathode on the anode. The package cover comprises a silicon carbonitride layer and a barrier layer that is formed over the silicon carbonitride surface. The barrier layer is composed consisting of silicide and other metals. It can be selected from at least one of the following: tantalum silicide; hafnium disilicide; chromium silicide; molybdenum silicide; disilicide tungsten. The metal oxide may be selected from aluminum trioxide and titanium dioxide. The life span of the above organic light-emitting devices is longer.

3. To prepare the silicon-germanium alloy that is used to make thermoelectric elements.

The silicon-germanium alloy-based thermoelectric element comprises an electrode layer, a silicone-germanium alloy thermoelectric layer and a barrier layer between the electrode layer and the silicon-germanium alloy thermoelectric layer. The barrier layer is made up of silicide and silicon nitride. A minimum of one silicide of molybdenum and tungsten silicides as well as cobalt silicides and nickel silicides is used. The interface between the silicon-germanium-based thermoelectric element and silicon is well bonded. There are no cracks or apparent diffusion phenomena at this point.

4. To make the cermet coating that has high temperature resistance, oxidation resistance and other characteristics.

The coating is composed of intermetallic, refractory, and refractory compounds. The thickness ranges from 10 to 50mm. The refractory metal is at least one of molybdenum tantalum, zirconium and hafnium. The refractory carbide is made up of silicon carbide, and some or all of tantalum carbide zirconium carbide and hafnium carbide; the intermetallic compound is one or more of molybdenum silicide, zirconium silicide, tantalum silicide, tantalum carbosilicide zirconium carbosilicide, and hafnium silicide. The crystal structure for the coating is composed of amorphous nanoparticles and/or polycrystalline ones.

Hafnium Silicide HFSi2 Powder

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Hafnium silicicide HfSi2 Pearl Supplier

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