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Zinc Nitride: Overview
Its chemical formula is Zn3N2, gray crystalline, soluble with hydrochloric Acid. It decomposes quickly into zinc hydroxide, and ammonia when placed in cold water. It can be produced by reacting ammonia with zinc powder at 500-600degC.
The following are some examples of how to use
Zinc nitride film is prepared using this product
Zinc Nitride (Zn3N2) is a unique material with electrical and optical properties. The energy band gaps of zinc oxide, whether an indirect or direct band gap silicon, have always been the source of controversy in semiconductors. The band gap can be greatly affected by the preparation methods, growth conditions and problems in industry and academia. As an example, prior art methods like magnetron deposition, chemical vapour deposition, electrostatic elctrostalysis, and molecular beam epitaxy are used to create zinc nitride layers.
Zinc oxide films made by the same technique have very different optical and electric properties. A simple, easy to reproduce and high-quality crystalline preparation method is urgently needed. A method is presented for the preparation of a zinc-nitride layer. The preparation method uses atomic layer deposition to prepare the Zinc Nitride film. This allows for precise control of the band gaps in the Zinc Nitride film. The prepared membrane is uniform, complete, and has excellent performance.
The technical solutions that were adopted include:
Steps for the preparation of zinc nitride films include:
1) Place the substrate inside the reaction chamber.
(2) Adsorb the zinc atoms on the substrate surface by introducing the zinc-containing pre-deposition source into the reaction chamber.
(3) Allow the nitrogen-containing pre-cursor source to enter the reaction-chamber of the atomic-layer deposition equipment and then ionize it through plasma. After ionization of the precursor source, the zinc-zinc covalent bonds are formed on the surface. Ionization of the nitrogen precursor. The source will be sent to the equipment for atomic layer deposition. After ionization the nitrogen atoms are partially deposited in the cavity. The zinc atom is bonded to the nitrogen atom by a covalent bond.
Repeat steps (2) and (3) for a layer-by-layer growth of the zinc nitride.
The method can produce high-quality crystalline materials and is repeatable. It is simple to implement and achieves crystals of excellent quality. The nitrogen is introduced to the atomic layer system via the plasma. After that, the conditions of the chamber are adjusted, including the vacuum, the cycle time, the conditions for the plasma and the chamber temperature. Adjust the band-gap of the prepared zincnitride. The present invention provides various high quality zinc nitride sheets with adjustable bands gaps that can be tailored to meet different electrical and optical requirements.
2. Useful for preparing a touch screen screen cover and film.
As technology advances and smart devices become more common, the demand for touch screens to be the main interface for human-computer interactions is increasing. In the prior art, the low coating yield and high production costs, as well as the low production efficiency, were problems when the light-shielding layers in the BM of the cover of the touchscreen was prepared by screen printing with black ink. The bubbles are easily produced when the product is used together with a Liquid Crystal Display. Offer a zinc nitride-based touch screen and touchscreen cover film.
The new touch screen film is made of zinc nitride, which acts as a functional layer on the black film. This film has a low surface reflectivity, low production cost, high surface hardness with strong scratch resistance and wear resistant, high surface energy and can effectively be laminated liquid-crystal display. Its thickness ranges from 60 to 200nm which can eliminate stepping. The new type is a touch-screen cover film that includes a Zn3N2 film and a Si3N4 film. The adhesion of a film decreases if its thickness exceeds 50 nm. If it’s less than 10 nm thick, then the film transmits light and does not have the light-tightness effect. The zinc film is black, absorbs visible light well, and has a matte finish. It can be used to create a functional black layer. The touch-screen cover film embodiment includes in order a zincnitride(Zn3N2)film, a silica nitride(Si3N4)film, and a protection film. This embodiment’s touch screen includes the aforementioned glass substrate, the touch-screen cover film and the zinc nitride of the touch-screen cover film.
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