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What is Zirconium Silicide?

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What is it? Zirconium Silicide ? Zirconium Silicide is a zirconium/silicon intermetallic compounds. It is a ceramic material of high temperature with excellent hardness, melting point, electrical conductivity, thermal conductivity, as well as high thermal shock resistance. It is both a structural material and a new type engineering material that can be used with high-temperature, corrosive media.
These are the main features of Zirconium Silicide
Zirconium Silicide is a metallic gray orthorhombic, shiny crystal having a relative density of 4.8822. Zirconium Silicide is insoluble with water, mineral acids, and aqua regia. It is however, soluble with hydrofluoric acid.
Zirconium Silicide Properties
Other Titles zirconium(IV) silicide, zirconium disilicide, ZrSi2 powder
No. 12039-90-6
Combination Formula ZrSi2
Molecular Weight 147.4
Appearance Gray Black Powder
Melting Point N/A
Boiling Point N/A
Density 4.88 g/cm3
Solubility of H2O N/A
Exact 145.858557
Zirconium Silicide Zi2 Powder CAS 12039-9
Zirconium Silicide applications
It is used as a fine ceramic raw material powder to produce crucibles that are used in the production of semiconductor thin film production.
Production of Zirconium Silicium
Method for creating zirconium silicide Nanomaterials. This involves: (1) adding 5mmol Zirconium dioxide, 5mmols of silicon powder, and 50mmols of metallic lithium to a 20 milliliter stainless steel Autoclave. Next, seal the autoclave with sealing. Finally, place the autoclave into an Electric Furnace that heats up. After the temperature rises to 600°C, the reaction continues for 40 hours before it is naturally cooled down to room temperature.
(2) The reaction product was first washed in distilled water. Next, it was washed twice with dilute HCl and dehydrated Ethan. Finally, it was filtered and dried for 4 hours in a vacuum drying chamber at 60°C to obtain zirconium Silicide nanometers.
The main supplier of Zirconium Silicide
Tech Co., Ltd. () is a professional silicide oil Over 12 years' experience in chemical products development and research. We accept credit cards, T/T and West Union payments. We will ship goods overseas via FedEx, DHL and by air or sea to our customers.
You can find high-quality powdered boron carbide here Please contact us Send an inquiry


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Silicide Powder

Cobalt Silicide CoSi2 Powder CAS 12017-12-8

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About Cobalt Silicide CoSi2 Powder:
Cobalt Silicide is an intermetallic compound, a silicate of cobalt. It is a superconductor with a Ca transition temperature. Cobalt disilicide, chemical formula CoSi2.Molecular weight 115.11.Dark brown rhombic crystal.Melting point 1277℃, relative density 5.3. It can be oxidized at 1200℃ to erode its surface; Reacts with fluorine at low temperatures, and with chlorine at 300 ° C. Attack by hydrogen fluoride, dilute, concentrated nitric acid and sulfuric acid, also can be violently attacked by molten strong alkali. It acts slowly with boiling concentrated hydrochloric acid.
CoSi2 has low resistivity, good thermal stability, and is widely used as a contact in large-scale integrated circuits. And CoSi2 has a similar crystal structure to Si, so it can form an epitaxial CoSi2/Si structure on Si substrate, which is used to study the interface characteristics of epitaxial silicon metal. Feel free to send an inquiry to get the latest price if you would like to buy Cobalt Silicide CoSi2 Powder in bulk.

Characteristics of Cobalt Silicide CoSi2 Powder:
Cobalt silicide CoSi2 powder (CAS 12017-12-8) has a high melting point, high corrosion resistance, high oxidation resistance, good electrical conductivity, high-temperature ductility, a binary alloy systemthe intermediate phase.

Technical Parameter of Cobalt Silicide CoSi2 Powder:

Product NameMFPurityParticle SizeMelting PointDensityColor
cobalt silicideCoSi299%5-10um1277℃5.3 g/cm3black


How is Cobalt Silicide CoSi2 Powder produced?
In general, the manufacturing method of cobalt disilicide is to first form metal cobalt (CO) layer on a silicon substrate and then after two annealing treatments to convert cobalt to Cobalt disilicide. The first annealing process involves the diffusion of shillings of cobalt into a siliceous substrate to form a layer of cobalt silicate (COSi). The second annealing process is to convert the cobalt silicate layer into Cobalt disilicide with a low resistance to reduce the resistance of the component.
 
Application of Cobalt Silicide CoSi2 Powder:
Cobalt Silicide CoSi2 Powder is used in optoelectronic devices, electronic devices, energy devices, lasers, semiconductors, etc.
Silicide nanostructures have potential important applications in a series of fields of nanoelectronics: semiconductor silicide nanostructures (FeSi2) can be used to prepare nano-electronic active devices, which may have very important applications in silicon-based nano-luminescent devices; Metallic silicides (CoSi2, NiSi2) can be used as nanowires in future quantum computers and fault-tolerant terahertz nanocircuit computers. Since epitaxial silicide conductors can be prepared on silicon substrates, their performance will be greatly improved compared with ordinary metal nanowires because of the absence of grain boundaries.Au nanostructures can also be used in molecular electronics as a single molecule or nanoelectrode of several molecules. In the process of semiconductor components, low resistance Cobalt disilicide (CoSi2) layers are formed at internal electrical connection points such as gate, source, or drain.

Packing & Shipping of Cobalt Silicide CoSi2 Powder:
We have many different kinds of packing which depend on the cobalt silicide CoSi2 powder quantity.
Cobalt silicide CoSi2 powder packing: vacuum packing, 1kg/bag, 25kg/barrel, or as your request.
Cobalt silicide CoSi2 powder shipping: could be shipped out by sea, by air, by express as soon as possible once payment receipt.

Cobalt Silicide Properties

Other Namescobalt(II) silicide, cobalt disilicide,
cobalt monosilicide (CoSi), CoSi2 powder
CAS No.12017-12-8
Compound FormulaCoSi2
Molecular Weight115.104
AppearanceGray Black Powder
Melting Point1277℃
Boiling PointN/A
Density5.3 g/cm3
Solubility in H2OInsoluble
Exact Mass114.887054 Da
  
  

Cobalt Silicide Health & Safety Information

Signal WordDanger
Hazard StatementsH315-H319-H334-H317-H351-H335
Hazard CodesXi, Xn
Risk CodesN/A
Safety StatementsN/A
Transport InformationNONH for all modes of transport
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Silicide Powder

Tungsten Silicide WSi2 Powder CAS 12039-88-2

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About Tungsten Silicide WSi2 Powder :
Tungsten silicide (WSi2) is an inorganic compound, a silicide of tungsten. It is a conductive ceramic material. Tungsten silicide reacts violently with substances between strong acids, fluorine, oxidants and halogens. WSi2 as an anti-oxidation coating performs well in applications. In particular, similar to molybdenum disilicide MoSi2, the high emissivity of tungsten disilicide makes this material attractive for high-temperature radiant cooling and has the meaning of a heat shield.
 
Silicide is used in microelectronics as contact material, with a resistivity of 60-80μΩcm; it forms 1000°C. It is usually used as a shunt for polysilicon wires to increase their conductivity and increase signal speed. The silicide layer can be prepared by chemical vapor deposition, for example, using monosilane or dichlorosilane and tungsten hexafluoride as the source gas. The deposited film is non-stoichiometric and requires annealing to convert to a more resulting stoichiometric form. Tungsten silicide is a substitute for the early tungsten film. Tungsten silicide can also be used in microelectromechanical systems and oxidation-resistant coatings. Feel free to send an inquiry to get the latest price if you would like to buy Tungsten Silicide WSi2 Powder in bulk.

Characteristics of Tungsten Silicide WSi2 Powder:
Tungsten silicide WSi2 powder (CAS 12039-88-2) has a high melting point, high corrosion resistance, high oxidation resistance, good electrical
conductivity, high-temperature ductility, a binary alloy system the intermediate phase.

Technical Parameter of Tungsten Silicide WSi2 Powder:

Product NameMFPurityParticle SizeMelting PointDensityColor
tungsten silicideWSi299%5-10um2165℃9.4 g/cm3black


Chemical Composition of Tungsten Silicide WSi2 Powder:

WSi2WSiCPFeS
＞99%＞76.1%balance0.01%0.02%0.20%0.004%


How is Tungsten Silicide WSi2 Powder produced?
Tungsten powder and silicon powder are used as raw materials for synthetic silicide tungsten powder. They have an average of 24 hours in acetone. The starting powder is used in the measurement of thermal measurements, while the powder is 5: 1. Dry substances and dried, acetone evaporation. The preparative mixture was heat-treated at different temperatures at 50 ° C at different temperatures of 1250 to 1400 ° C. The heating rate is 10k · min -1. The mixture was placed in a tube furnace and heat treatment was carried out in an argon flow for 4 hours. After the heat treatment is over, the furnace is cooled to room temperature.
 
Application of Tungsten Silicide WSi2 Powder :
Tungsten silicide WSi2 powder is used in microelectronics as an electric shock material, shunting on polysilicon wires, anti-oxidation coating and resistance wire coating. Tungsten silicide is used as a contact material in microelectronics, with a resistivity of 60-80μΩcm; it is formed at 1000°C. It is usually used as a shunt for polysilicon lines to increase their conductivity and increase signal speed. The tungsten silicide layer can be prepared by chemical vapor deposition, such as vapor deposition. Use monosilane or dichlorosilane and tungsten hexafluoride as raw material gas. The deposited film is non-stoichiometric and requires annealing to transform into a more conductive stoichiometric form.
Tungsten silicide can replace the early tungsten film. Tungsten silicide is also used as a barrier layer between silicon and other metals.
Tungsten silicide is also very valuable in micro-electromechanical systems, in which tungsten silicide is mainly used as a thin film for the manufacture of microcircuits. For this purpose, a film of tungsten silicide can be plasma-etched using, for example, silicide.

Packing & Shipping of Tungsten Silicide WSi2 Powder:
We have many different kinds of packing which depend on the tungsten silicide WSi2 powder quantity.
Tungsten silicide WSi2 powder packing: vacuum packing, 1kg/bag, 25kg/barrel, or as your request.
Tungsten silicide WSi2 powder shipping: could be shipped out by sea, by air, by express as soon as possible once payment receipt.

Tungsten Silicide Properties

Other Namestungsten disilicide, WSi2 powder
CAS No.12039-88-2
Compound FormulaWSi2
Molecular Weight240.01
AppearanceGray Black Powder
Melting Point2160℃
Boiling PointN/A
Density9.3 g/cm3
Solubility in H2ON/A
Exact Mass239.904786
  
  

Tungsten Silicide Health & Safety Information

Signal WordN/A
Hazard StatementsN/A
Hazard CodesN/A
Risk CodesN/A
Safety StatementsN/A
Transport InformationN/A
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Silicide Powder

Titanium Silicide TiSi2 Powder CAS 12039-83-7

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About Titanium Silicide TiSi2 Powder:
With the rapid development of large integrated circuits (ULSI), the size of the equipment and equipment is getting smaller, the requirements for equipment size, film quality, and thickness uniformity are getting higher.

At present, the wire width of the semiconductor device has been reduced to less than 0.1 μm, so it is impossible to obtain a continuous conductor having a low resistance during the original process.

New materials, new processes, and new deposition systems must be found to improve or replace aluminum and heavy-doped polysilicon for circuit metallization.

In these new materials, metal silicon having high conductivity and high-temperature stability has increasing interest, compatible with the current microelectronic manufacturing process. Titanium Disilicide has low resistivity, high temperature and good stability.
In a commonly studied metal silicide (such as TSI2, Nisi, Cosi2, WSI2, Tasi2, MOSI2), silicide (Tisi2) has ideal characteristics: high conductivity, high selectivity, good thermal stability, good SI Adsorption, good process adaptation of silicon adaptive connection parameters. Therefore, in the integrated circuit device, titanium silicide is widely used to produce a metal oxide semiconductor (MOS), a metal oxide semiconductor field-effect transistor (MOSFET) and a dynamic random access memory (DRAM) gate, source/leakage, mutual contact ohm. Feel free to send an inquiry to get the latest price if you would like to buy Titanium Silicide TiSi2 Powder in bulk.

Characteristics of Titanium Silicide TiSi2 Powder:
Titanium silicide TiSi2 powder (CAS 12039-83-7) has a high melting point, high corrosion resistance, high oxidation resistance, good electrical conductivity, high temperature ductility, a binary alloy systemthe intermediate phase.

Technical Parameter of Titanium Silicide TiSi2 Powder:

Product NameMFPurityParticle SizeMelting PointDensityColor
titanium silicideTiSi299%5-10um1620℃4.0 g/cm3black


Chemical Composition of Titanium Silicide TiSi2 Powder:

TiSi2TiSiCPFeS
＞99%46.32%52.5%0.02%0.02%0.19%0.01%


How is Molybdenum Silicide MoSi2 Powder produced?
Ti silicide can be obtained from the reaction between titanium or hydride and silicon.
Ti + 2 Si → Tisi2
Aluminum heat can also be performed by the ignition of aluminum powder, sulfur, silica and titanium dioxide or hexafluoritititoetice, by electrolysis of hexafluoride titanate and titanium dioxide, or through tetrachloride reaction.
Another method is to react with titanium tetrachloride to silane, dichloronilane or silicon.
TiCl4 + 2 SiH4 → Tisi2 + 4 HCl + 2 H2
TiCl4 + 2 SiH2Cl2 + 2 H2 → Tisi2 + 8 HCL
TiCl4 + 3 Si → Tisi2 + SiCL4
 
Applications of Molybdenum Silicide MoSi2 Powder:
Titanium disilicide is used in the semiconductor industry. It is typically grown by means of salicide technology over silicon and polysilicon lines to reduce the sheet resistance of local transistor connections. In the microelectronic industry, it is typically used in the C54 phase.
1. Silicide Titanide is low, the melting point is high, and the chemical properties are stable, and there is a broad use prospect in the microelectronics field.
2. Aerospace industry, ship submarine manufacturing, medical, jewelery manufacturing.

Packing & Shipping of Titanium Silicide TiSi2 Powder :
We have many different kinds of packing which depends on the titanium silicide TiSi2 powder quantity.
Titanium silicide TiSi2 powder packing: vacuum packing, 100g, 500g or 1kg/bag, 25kg/barrel, or as your request.
Titanium silicide TiSi2 powder shipping: could be shipped out by sea , by air, by express as soon as possible once payment receipt.


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If you are looking for high-quality TiSi2 powder, please feel free to contact us and send an inquiry.
 

Titanium Silicide Properties

Other NamesTiSi2 powder, titanium disilicide
CAS No.12039-83-7
Compound FormulaTiSi2
Molecular Weight104.04
AppearanceBlack Powder
Melting Point1470 °C
Boiling PointN/A
Density4.02 g/cm3
Solubility in H2ON/A
Exact Mass103.9018
  
  

Titanium Boride Health & Safety Information

Signal WordN/A
Hazard StatementsN/A
Hazard CodesN/A
Risk CodesN/A
Safety StatementsN/A
RTECS NumberN/A
Transport InformationN/A
WGK GermanyN/A
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