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hafnium silicide is a type of transition metal silicide, a refractory intermetallic compound. It is often used in cermets, high-temperature oxidation-resistant coatings and in aviation and aerospace applications. It is also an important raw material for generating hafnium carbide (HfC), which has many unique electrical, magnetic and thermoelectric properties.
HfC is a refractory refractory metal with a high melting point and an extremely low vapor pressure. It has good ductility and excellent erosion resistance in a wide range of temperatures. It is also highly resistant to chemical corrosion and has very good electrical conductivity. It is usually produced from zirconium, which is mined from underground deposits and extracted by ion-exchange and solvent extraction techniques. It is also prepared by magnesium reduction from crude zirconium tetrachloride (Kroll process) or by decomposition of tetraiodide using the de Boer-van Arkel method.
When thin (monolayer) or thick films of hafnium are deposited on clean and oxidized silicon surfaces and then annealed, the result is nanometer scaled elongated hafnium silicide islands. The formation and orientation of these structures depends largely on the surface symmetry of the substrate. In previous studies it was shown that the atomic structure of these silicide islands can be characterized by scanning tunneling microscopy, low energy electron emission spectroscopy (LEED) and X-ray photoelectron diffraction analysis.
American Elements produces a wide variety of hafnium silicide products in numerous forms and sizes. Our standard grades include Mil Spec; ACS, Reagent and Technical Grade; Food, Agricultural and Pharmaceutical Grade; USP and EP/BP (European Pharmacopoeia/British Pharmacopoeia). We can also provide high purity, submicron and nanopowder forms of hafnium silicide.